Paul W. Ackmann
Fellow Engineer
SPIE Involvement:
Author | Editor
Publications (34)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Modeling, Lithography, Optical lithography, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing, Model-based design, Process modeling, 193nm lithography

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Analytics, Lithography, Reticles, Metrology, Etching, Process control, Photomasks, Critical dimension metrology, OLE for process control

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Logic, Data modeling, Silicon, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Modulation, Metals, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Atrial fibrillation, Signal attenuation, Electrons, Distortion, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Photomasks, Panoramic photography, Semiconducting wafers

Showing 5 of 34 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 29 October 2014

SPIE Conference Volume | 10 October 2013

Conference Committee Involvement (6)
Photomask Technology
11 September 2017 | Monterey, California, United States
Photomask Technology
12 September 2016 | San Jose, California, United States
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
16 September 2014 | Monterey, United States
Showing 5 of 6 Conference Committees
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