Dr. Paul C. Allen
Program Manager at Applied Materials
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 23 March 2020
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Deep ultraviolet, Printing, Data processing, Photomasks, Extreme ultraviolet, Raster graphics, Data conversion, Laser optics

Proceedings Article | 15 February 2012
Proc. SPIE. 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
KEYWORDS: Lithography, Data modeling, Calibration, Etching, Silicon, Manufacturing, Photoresist materials, Transmittance, Photomasks, Semiconducting wafers

SPIE Journal Paper | 1 July 2007
JM3 Vol. 6 Issue 03
KEYWORDS: Bragg cells, Acousto-optics, Acoustics, Photomasks, Spiral phase plates, Transducers, Phase shift keying, Optical lithography, Spatial filters, Image enhancement

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Deep ultraviolet, Metals, Printing, Photomasks, Artificial intelligence, Optical alignment, Bragg cells, Semiconducting wafers, Evolutionary algorithms

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Logic, Calibration, Metals, Error analysis, Composites, Printing, Plasma etching, Critical dimension metrology, Photoresist processing, Standards development

Showing 5 of 13 publications
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