Dr. Paul D. Ashby
at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Calibration, Chemistry, Atomic force microscopy, Scanning electron microscopy, Scanning probe microscopy, Line edge roughness, Line scan image sensors

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Metals, Photons, Molecules, Electrons, Photoresist materials, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography, Chemically amplified resists

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Calibration, Ions, Silicon, Chemistry, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Extreme ultraviolet lithography, Scanning probe microscopy, Neodymium

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Electron beam lithography, Image processing, Molecules, Image resolution, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Chemically amplified resists

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