Dr. Paul D. Ashby
at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Electrons, Molecules, Extreme ultraviolet, Photons, Extreme ultraviolet lithography, Photoresist materials

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Electron beam lithography, Scanning electron microscopy, Scanning probe microscopy, Chemistry, Calibration, Line scan image sensors, Electron beams, Atomic force microscopy, Lithography, Line edge roughness

Proceedings Article | 16 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Absorbance, Chemically amplified resists, Line width roughness, Electrons, Photons, Molecules, Photoresist materials, Metals

Proceedings Article | 18 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Atomic force microscopy, Neodymium, Chemistry, Scanning probe microscopy, Ions, Silicon, Scanning electron microscopy, Calibration, Extreme ultraviolet lithography, Transmission electron microscopy

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Line edge roughness, Molecules, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Image resolution, Electron beam lithography, Extreme ultraviolet, Chemically amplified resists, Image processing

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