Paul Blackborow
Business Development at Hamamatsu Photonics
SPIE Involvement:
Publications (10)

SPIE Journal Paper | 21 May 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Plasma, Light sources, Photomasks, Metrology, Inspection, Modulators, Xenon, Extreme ultraviolet lithography, Magnetism

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Light sources, Data modeling, Inspection, Physics, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Light sources, Metrology, Copper, Inspection, Magnetism, Modulators, Xenon, Photomasks, Extreme ultraviolet, Plasma

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Light sources, Metrology, Switches, Modulators, Xenon, Diodes, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Chaos

Proceedings Article | 18 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Light sources, Metrology, Electrodes, Copper, Reliability, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma

Showing 5 of 10 publications
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