Dong-Hoon Chung
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (39)

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Databases, Inspection, Data processing, Photomasks

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Optical properties, Image processing, Coating, Inspection, Photomasks, Extreme ultraviolet, Neodymium, Semiconducting wafers, Liquids, Defect inspection

Proceedings Article | 16 September 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Metrology, Logic, Image processing, Image analysis, Printing, Photomasks, Computed tomography, Logic devices, Optical proximity correction, Critical dimension metrology

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Semiconductors, Lithography, Metrology, Error analysis, Reliability, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

Proceedings Article | 1 October 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Lithography, Calibration, Image processing, Scanners, Inspection, Printing, Photomasks, Source mask optimization, SRAF, Model-based design

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Wafer-level optics, Signal to noise ratio, Defect detection, Deep ultraviolet, Inspection, Optical inspection, Printing, Photomasks, Geometrical optics, Semiconducting wafers

Showing 5 of 39 publications
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