Paul DePesa
Retired
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Computed tomography, Optical proximity correction, Operating systems, Databases, Data processing, Sun, Photomasks, Beam shaping, Analytical research, Beam analyzers

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Computed tomography, Databases, Photomasks, Optical proximity correction, Data processing, Resolution enhancement technologies, Beam shaping, Vestigial sideband modulation, Logic, Computer aided design

Proceedings Article | 22 January 2001 Paper
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Inspection, Reticles, Manufacturing, Photomasks, Optical proximity correction, Databases, Computed tomography, Standards development, Binary data, Lithography

Proceedings Article | 22 January 2001 Paper
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Computed tomography, Databases, Photomasks, Manufacturing, Windows NT, Sun, Optical proximity correction, Logic, Array processing, Photomask technology

Proceedings Article | 7 December 1994 Paper
Proc. SPIE. 2322, 14th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Photomasks, Reflectivity, Photomask technology, Photoresist materials, Aluminum, Thin films, Head, Opacity, Solids, Lithography

Showing 5 of 7 publications
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