Mr. Paul G. Dewa Profile

Paul G. Dewa

Applied Technology Manager at Corning Tropel Corp

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Author

Publications (14)

Proceedings Article | 21 June 2019 Paper

Polarization metrology for high numerical aperture DUV objectives

Robert Grejda, Paul Michaloski, Duncan Spaulding, Stephen Mack, Robert Michaels, Paul Dewa, David Aronstein

Proceedings Volume 11057, 110570P (2019) https://doi.org/10.1117/12.2525606

KEYWORDS: Polarization, Polarimetry, Objectives, Birefringence, Deep ultraviolet, Crystals, Sensors, Nanolithography, Thin film coatings, Silica

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Proceedings Article | 23 August 2017 Paper

Advancements in adhesive mounting of optics

Brian McMaster, Robert Grejda, Paul Dewa

Proceedings Volume 10371, 1037103 (2017) https://doi.org/10.1117/12.2275977

KEYWORDS: Adhesives, Optical mounts, Ultraviolet radiation, Contamination, Lenses

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Proceedings Article | 29 June 2006 Paper

Advances in diamond-turned surfaces enable unique cost-effective optical system solutions

Joshua Cobb, Lovell Comstock, Paul Dewa, Mike Dunn, Scott Flint

Proceedings Volume 6269, 62691L (2006) https://doi.org/10.1117/12.672207

KEYWORDS: Spectroscopy, Distortion, Diffraction gratings, Imaging systems, Hyperspectral imaging, Mirrors, Diamond, Optical alignment, Infrared imaging, Optical design

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Proceedings Article | 4 May 2006 Paper

Innovative manufacturing and test technologies for imaging hyperspectral spectrometers

Joshua Cobb, Lovell Comstock, Paul Dewa, Mike Dunn, Scott Flint

Proceedings Volume 6233, 62330R (2006) https://doi.org/10.1117/12.665889

KEYWORDS: Spectrometers, Hyperspectral imaging, Distortion, Imaging systems, Diffraction gratings, Optical alignment, Mirrors, Infrared imaging, Optical design, Manufacturing

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Proceedings Article | 28 May 2004 Paper

Optical metrology for 193-nm immersion objective characterization

David Aronstein, Julie Bentley, Paul Dewa, Michael Dunn, Horst Schreiber, Thanh Nguyen, James Webb

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536383

KEYWORDS: Water, Objectives, Absorption, Optical spheres, Wavefronts, Interferometers, Liquids, Interferometry, Microscopes, Monochromatic aberrations

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Proceedings Article | 30 July 2002 Paper

Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH

Jeff Meute, Georgia Rich, Stefan Hien, Kim Dean, Carolyn Gondran, Julian Cashmore, Dominic Ashworth, James Webb, Lisa Rich, Paul Dewa

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474621

KEYWORDS: Fiber optic illuminators, Contamination, Optical components, Objectives, Semiconducting wafers, Mirrors, Reticles, Lithography, Wafer-level optics, Failure analysis

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Proceedings Article | 30 July 2002 Paper

Laser resistance of fused silica for microlithography: experiments and models

Johannes Moll, Paul Dewa

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474564

KEYWORDS: Absorption, Glasses, Silica, Photorefraction, Birefringence, Wavefront distortions, Pulsed laser operation, Optical lithography, Color centers, Excimer lasers

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Proceedings Article | 30 July 2002 Paper

157-nm system test for high-NA lithographic lens systems

Horst Schreiber, Paul Dewa, K. Hanford, Robert Ligenza, Lisa Rich, Paul Tompkins

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474556

KEYWORDS: Wavefronts, Interferometers, Spatial coherence, Polarizers, Birefringence, Lithography, Polarization, Phase measurement, Oxygen, Interferometry

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Proceedings Article | 30 July 2002 Paper

Aberration determination in early 157-nm exposure system

Bruce Smith, Will Conley, Cesar Garza, Jeff Meute, Daniel Miller, Georgia Rich, Victoria Graffenberg, Kim Dean, Shashikant Patel, Arnie Ford, James Foster, Marco Moers, Kevin Cummings, James Webb, Paul Dewa, Azeddine Zerrade, Susan MacDonald, Greg Hughes, Peter Dirksen

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474551

KEYWORDS: Photomasks, Monochromatic aberrations, Scanning electron microscopy, Image processing, Lithography, Manufacturing, Imaging systems, Wavefronts, Zernike polynomials, Edge detection

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Proceedings Article | 14 September 2001 Paper

Error separation technique for microlithographic lens testing with null configurations

Stephen Mack, Timothy Rich, James Webb, Paul Dewa, Horst Schreiber

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435669

KEYWORDS: Wavefronts, Monochromatic aberrations, Interferometers, Lithography, Fluorine, Optical fabrication, Optical testing, Calibration, Excimer lasers, Spherical lenses

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Lithographic lens systems are continually being designed to work at shorter wavelengths and higher numerical apertures. The prospect of 157 nm F₂ excimer-based lithography presents many demanding new challenges to lithographic lens manufacturers. Lens fabricators must re-orient themselves to handling and finishing more delicate optical materials such as calcium fluoride to unprecedented surface requirements. Thin film engineers are pressed to deliver a multitude of new optical coatings, but with a dramatically limited selection of raw materials. And optical test engineers are presented with new testing challenges: among them is at-wavelength interferometric testing of lithographic objectives using an F₂ excimer laser source. Requirements for constructing such an interferometer dictate a design containing several nitrogen-purged beam paths and a camera capable of detecting 157 nm radiation. These contribute to an interferometer that is cumbersome and expensive when applied to production testing of lithographic lens assemblies. In addition, complications emerge in the interferometer design due to the relatively poor coherence in the 157 nm F₂ excimer source. Fortunately, off-wavelength sources (usually at a 'user-friendly' longer wavelength) can be applied to transmitted wavefront testing of lithographic objectives designed for shorter wavelengths, while still providing nearly perfect and predictable at-wavelength imagery. This testing approach requires additional null optics to correct for off-wavelength spherochromatism effects. We have successfully used off-wavelength 248 nm interferometer testing to characterize 193 nm ArF lens systems, and this approach has been extended to the 157 nm regime by incorporating a well-characterized null corrector. We explain methods to perform null corrector characterization: We describe a technique to separate the non-rotationally symmetric errors introduced by a multi-element null corrector from the errors in the lithographic lens under test. We also discuss methods to characterize the rotationally symmetric errors introduced by this null corrector. In addition, we describe a method to cascade the error separation algorithm such that additional non-rotationally symmetric errors are also isolated. Test results are included and discussed.

Proceedings Article | 14 September 2001 Paper

157-nm Twyman-Green interferometer for lens testing

Bryan Statt, Paul Dewa, Stephen Mack, Horst Schreiber, Bryan Stone, Paul Tompkins

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435644

KEYWORDS: Interferometers, Mirrors, Lithography, Light sources, Wavefronts, Sensors, Reflectivity, Spherical lenses, Nitrogen, Relays

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Proceedings Article | 14 September 2001 Paper

Applications of a grating shearing interferometer at 157 nm

Horst Schreiber, Paul Dewa, Michael Dunn, Richard Hordin, Stephen Mack, Bryan Statt, Paul Tompkins

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435643

KEYWORDS: Wavefronts, Shearing interferometers, Diffraction gratings, Interferometers, Diffraction, Light sources, Spatial coherence, Collimation, Cameras, Beam shaping

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Proceedings Article | 1 September 1998 Paper

New flatness measurement instrument for 230-mm lapped and polished photomasks

Paul Dewa, Andrew Kulawiec, Stephen Mack, John Nemechek

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328803

KEYWORDS: Photomasks, Surface finishing, Polishing, Interferometers, Interferometry, Prisms, Reflection, Process control, Beam splitters, Optical design

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Proceedings Article | 8 August 1993 Paper

Depth of focus and resolution enhancement of i-line and deep-UV lithography using annular illumination

William Partlo, Paul Tompkins, Paul Dewa, Paul Michaloski

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150420

KEYWORDS: Semiconducting wafers, Deep ultraviolet, Lithographic illumination, Prototyping, Critical dimension metrology, Lithography, Imaging systems, Reticles, Axicons, Control systems

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Showing 5 of 14 publications

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