Paul Graeupner
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (42)

Proceedings Article | 18 November 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Mirrors, Multilayers, Scanners, Wavefronts, Extreme ultraviolet, Transistors, Extreme ultraviolet lithography

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Optical lithography, Sensors, Scanners, Lens design, Buildings, Printing, Projection systems, Extreme ultraviolet lithography, High volume manufacturing, Device simulation

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Scanners, Particles, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Optics manufacturing, Stochastic processes

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Mirrors, Metrology, Lithographic illumination, Projection systems, Light sources and illumination, Extreme ultraviolet, Extreme ultraviolet lithography, Optics manufacturing, EUV optics

Proceedings Article | 16 October 2019 Presentation
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Mirrors, Optical design, Lithographic illumination, Imaging systems, Scanners, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, EUV optics

Showing 5 of 42 publications
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