Paul D. Harris
at Nikon Precision Europe GmbH
SPIE Involvement:
Publications (5)

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004)
KEYWORDS: Photomasks, Lithography, Manufacturing, Nanoimprint lithography, Optical lithography, Phase shifts, Photoresist processing, Semiconducting wafers, Monochromatic aberrations, Semiconductors

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004)
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Optical proximity correction, Semiconducting wafers, Coherence (optics), Computer simulations, Electromagnetism, Transmissive materials

Proceedings Article | 16 June 2003 Paper
James Welsh, Martin McCallum, Masashi Okada
Proceedings Volume 5037, (2003)
KEYWORDS: Inspection, Photomasks, Defect detection, Silicon, Optical inspection, Imaging systems, Scanning electron microscopy, Diffraction, Non-optical lithography, Lithography

Proceedings Article | 2 June 2003 Paper
Proceedings Volume 5038, (2003)
KEYWORDS: Deep ultraviolet, Reticles, Semiconducting wafers, Optical alignment, Lithography, Scanners, Overlay metrology, Metrology, Computer aided design, Critical dimension metrology

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002)
KEYWORDS: Quantum efficiency, Picosecond phenomena, Printing, Inspection, Defect inspection, Quartz, Critical dimension metrology, Imaging systems, Gemini Planet Imager, Optical lithography

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