Dr. Paul Hinnen
System Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Etching, Manufacturing, Inspection, Control systems, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Electron beams, Metrology, Logic, Scanners, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 22 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Sensors, Scanners, Control systems, Process control, Servomechanisms, Optimization (mathematics), Semiconducting wafers, Yield improvement, Model-based design

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Optical lithography, Etching, Scanners, Computer simulations, Scatterometry, Optical metrology, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Diffraction, Metrology, Etching, Scanners, Process control, Semiconducting wafers, Overlay metrology, Back end of line, Front end of line

SPIE Journal Paper | 7 January 2014
JM3 Vol. 13 Issue 01
KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Lithography, Reticles, Metrology, Control systems, Projection lithography, Calibration, Actuators

Showing 5 of 24 publications
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