Dr. Paul K. Isbester
Application Scientist at Nova Measuring Instruments, Inc.
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 2 July 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Copper, Scatterometry, Machine learning

Proceedings Article | 23 May 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Fin field effect transistors, Germanium, Silicon, 3D metrology, Process control, Boron, Transistors, Epitaxy, Semiconducting wafers

Proceedings Article | 21 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Metals, Copper, Process control, Machine learning, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Back end of line, Front end of line

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Thin films, Metrology, Diffractive optical elements, Etching, Chemical species, Dielectrics, Transmission electron microscopy, Scatterometry, Solids, 3D metrology, Process control, Photomasks, Semiconducting wafers, Thin film devices, Channel projecting optics

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Etching, Copper, Dielectrics, 3D modeling, Scatterometry, 3D metrology, Process control, Photomasks, Semiconducting wafers, Back end of line

SPIE Journal Paper | 25 October 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Semiconducting wafers, Metrology, Optical lithography, Scatterometry, Critical dimension metrology, Finite element methods, Scatter measurement, Diffractive optical elements, Transmission electron microscopy, Reactive ion etching

Showing 5 of 14 publications
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