Dr. Paul K. Isbester
Application Scientist at Nova Measuring Instruments
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Scatterometry, Machine learning, Semiconducting wafers, Back end of line

Proceedings Article | 2 July 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Copper, Scatterometry, Machine learning

Proceedings Article | 23 May 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Fin field effect transistors, Germanium, Silicon, 3D metrology, Process control, Boron, Transistors, Epitaxy, Semiconducting wafers

Proceedings Article | 21 March 2018 Presentation + Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Metals, Copper, Process control, Machine learning, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Back end of line, Front end of line

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Etching, Copper, Dielectrics, 3D modeling, Scatterometry, 3D metrology, Process control, Photomasks, Semiconducting wafers, Back end of line

Showing 5 of 15 publications
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