Paul C. Knutrud
Vice President of Marketing and Technology at Inspectrology LLC
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Publications (10)

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Microelectromechanical systems, Metrology, Roads, Silicon, Nondestructive evaluation, Scanning electron microscopy, Optical metrology, Telecommunications, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Metrology, Logic, Etching, Image processing, Image acquisition, Scanning electron microscopy, Process control, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Electron beams, Metrology, Contamination, Data modeling, Atomic force microscopy, Scanning electron microscopy, Process control, Critical dimension metrology, Semiconducting wafers, Systems modeling

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Electron beams, Metrology, Scanning electron microscopy, Chemical analysis, Critical dimension metrology, Photoresist processing, Semiconducting wafers, 193nm lithography, Temperature metrology

PROCEEDINGS ARTICLE | July 16, 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Semiconductors, Metrology, Metals, Time metrology, Process control, Optical alignment, Niobium, Semiconducting wafers, Prototyping, Overlay metrology

PROCEEDINGS ARTICLE | July 16, 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Metrology, Detection and tracking algorithms, Metals, Image processing, Pattern recognition, Copper, Precision measurement, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 10 publications
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