Paul C. Knutrud
Vice President of Marketing and Technology at Inspectrology LLC
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Publications (10)

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Microelectromechanical systems, Scanning electron microscopy, Critical dimension metrology, Optical metrology, Metrology, Roads, Telecommunications, Semiconducting wafers, Nondestructive evaluation, Silicon

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Etching, Process control, Image processing, Image acquisition, Metrology, Photoresist processing, Lithography, Semiconducting wafers, Logic, Scanning electron microscopy

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Atomic force microscopy, Metrology, Electron beams, Data modeling, Contamination, Semiconducting wafers, Systems modeling, Process control

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Photoresist processing, Metrology, Lithography, Electron beams, Chemical analysis, 193nm lithography, Temperature metrology

Proceedings Article | 16 July 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Time metrology, Optical alignment, Process control, Prototyping, Metals, Niobium, Semiconductors

Showing 5 of 10 publications
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