Paul Luehrmann
Director - Metrology Applications Development at ASML Netherlands BV
SPIE Involvement:
Conference Program Committee | Author
Publications (13)

Proceedings Article | 2 April 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Metrology, Cadmium, Scanners, Scanning electron microscopy, Scatterometry, Time metrology, Cadmium sulfide, Optical proximity correction, High volume manufacturing, Semiconducting wafers

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Cadmium, Data modeling, Imaging systems, Scanners, Scanning electron microscopy, Printing, Scatterometry, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Metrology, Data modeling, Scanners, Control systems, Scatterometry, Time metrology, Process control, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Metrology, Cadmium, Inspection, Finite element methods, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Wafer-level optics, Lithography, Metrology, Imaging systems, Scanners, Inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Yield improvement

Showing 5 of 13 publications
Conference Committee Involvement (1)
Photomask Technology
18 September 2007 | Monterey, California, United States
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top