Mr. Paul A. Morgan
Principal Engineer R&D at Micron Technology Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (4)

PROCEEDINGS ARTICLE | October 26, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Defect detection, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Deep ultraviolet, Inspection, Image analysis, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Semiconducting wafers, Double positive medium

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Contamination, Defect detection, Air contamination, Scanners, Particles, Inspection, Photomasks, Image classification, Resolution enhancement technologies, Defect inspection

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Defect detection, Image processing, Inspection, Image restoration, Image resolution, Image analysis, Image transmission, Photomasks, Semiconducting wafers, Resolution enhancement technologies

Conference Committee Involvement (3)
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Photomask Technology
12 September 2016 | San Jose, California, United States
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