Paul Petric
Engineering Director
SPIE Involvement:
Publications (7)

Proceedings Article | 28 March 2014 Paper
Allen Carroll, Luca Grella, Kirk Murray, Mark McCord, Paul Petric, William Tong, Christopher Bevis, Shy-Jay Lin, Tsung-Hsin Yu, Tze-Chiang Huang, T. Wang, Wen-Chuan Wang, J. Shin
Proceedings Volume 9049, 904917 (2014)
KEYWORDS: Mirrors, Lithography, Semiconducting wafers, Error control coding, Reflectivity, Switching, Electrodes, Data compression, Printing, Electron beam lithography

SPIE Journal Paper | 5 August 2013 Open Access
Luca Grella, Allen Carroll, Kirk Murray, Mark McCord, William Tong, Alan Brodie, Thomas Gubiotti, Fuge Sun, Francoise Kidwingira, Shinichi Kojima, Paul Petric, Christopher Bevis, Bart Vereecke, Luc Haspeslagh, Anil Mane, Jeffrey Elam
JM3, Vol. 12, Issue 03, 031107, (August 2013)
KEYWORDS: Electrodes, Mirrors, Microelectromechanical systems, Semiconducting wafers, Tin, Electron beam lithography, Metals, Aluminum, Coating, Reflectivity

Proceedings Article | 8 November 2012 Paper
Regina Freed, Thomas Gubiotti, Jeff Sun, Anthony Cheung, Jason Yang, Mark McCord, Paul Petric, Allen Carroll, Upendra Ummethala, Layton Hale, John Hench, Shinichi Kojima, Walter Mieher, Chris Bevis
Proceedings Volume 8522, 85221J (2012)
KEYWORDS: Electron beam lithography, Lithography, Semiconducting wafers, Reflectivity, Logic, YAG lasers, Direct write lithography, Wafer-level optics, Computer aided design, Electron beams

Proceedings Article | 21 March 2012 Paper
Mark McCord, Paul Petric, Upendra Ummethala, Allen Carroll, Shinichi Kojima, Luca Grella, Sameet Shriyan, Charles Rettner, Chris Bevis
Proceedings Volume 8323, 832311 (2012)
KEYWORDS: Semiconducting wafers, Electron beam lithography, Wafer-level optics, Lithography, Metrology, Integrated optics, Electron beams, Reflectivity, Silicon, Modulation

Proceedings Article | 4 April 2011 Paper
Regina Freed, Jeff Sun, Alan Brodie, Paul Petric, Mark McCord, Kurt Ronse, Luc Haspeslagh, Bart Vereecke
Proceedings Volume 7970, 79701T (2011)
KEYWORDS: Electron beam lithography, Semiconducting wafers, Lithography, Electrodes, Mirrors, Microelectromechanical systems, Etching, Reflectivity, Electron beams, Tin

Showing 5 of 7 publications
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