Dr. Paul Tuffy
Product Manager at ASML
SPIE Involvement:
Publications (5)

Proceedings Article | 30 March 2017 Paper
Proceedings Volume 10147, 101471C (2017) https://doi.org/10.1117/12.2259750
KEYWORDS: Far infrared, Optical alignment, Semiconducting wafers, Sensors, Signal detection, Avalanche photodetectors, Signal processing, Scanners, Optical lithography, Overlay metrology

Proceedings Article | 20 October 2016 Paper
Jianming Zhou, Sarah Wu, Craig Hickman, Ewoud van West, Maurits van der Schaar, Wangshi Zhou, Youping Zhang, Sean Park, Paul Tuffy, Dan Ulmer, Cedric Affentauschegg, Henk Niesing
Proceedings Volume 9778, 97781G (2016) https://doi.org/10.1117/12.2219439

Proceedings Article | 24 March 2016 Paper
Proceedings Volume 9778, 97782M (2016) https://doi.org/10.1117/12.2219491
KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Scanners, Etching, Avalanche photodetectors, Optical lithography, Silicon, Metrology, Chemical mechanical planarization

Proceedings Article | 24 March 2016 Paper
Proceedings Volume 9778, 97781S (2016) https://doi.org/10.1117/12.2219467
KEYWORDS: Overlay metrology, Optical proximity correction, Diffraction, Critical dimension metrology, Metrology, Scanning electron microscopy, Electron microscopes, Optical lithography, Error analysis, Target detection

Proceedings Article | 19 March 2015 Paper
Young-Sik Kim, Young-Sun Hwang, Mi-Rim Jung, Ji-Hwan Yoo, Won-Taik Kwon, Kevin Ryan, Paul Tuffy, Youping Zhang, Sean Park, Nang-Lyeom Oh, Chris Park, Mir Shahrjerdy, Roy Werkman, Kyu-Tae Sun, Jin-Moo Byun
Proceedings Volume 9424, 942414 (2015) https://doi.org/10.1117/12.2085645
KEYWORDS: Overlay metrology, Metrology, Target detection, Semiconducting wafers, Optical proximity correction, Resolution enhancement technologies, Reticles, Lithography, Optical lithography, Etching

  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top