Dr. Paul Tuffy
Product Manager at ASML US Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 30 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Avalanche photodetectors, Optical lithography, Sensors, Scanners, Signal processing, Far infrared, Optical alignment, Semiconducting wafers, Signal detection, Overlay metrology

Proceedings Article | 20 October 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Target detection, Diffraction, Metrology, Optical lithography, Error analysis, Electron microscopes, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Overlay metrology

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Avalanche photodetectors, Optical lithography, Etching, Scanners, Silicon, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Target detection, Lithography, Reticles, Metrology, Optical lithography, Etching, Optical proximity correction, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies

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