Dr. Paul A. Zimmerman Profile

Dr. Paul A. Zimmerman

Soft Pellicle Project Manager at Intel Corp

SPIE Involvement:

Author

Publications (42)

Proceedings Article | 16 April 2011 Paper

Paper

Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography

Marie Krysak, Markos Trikeriotis, Evan Schwartz, Neal Lafferty, Peng Xie, Bruce Smith, Paul Zimmerman, Warren Montgomery, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 7972, 79721C (2011) https://doi.org/10.1117/12.879385

KEYWORDS: Etching, Nanoparticles, Resistance, Oxides, Photoresist materials, Electron beam lithography, Hafnium, Lithography, Extreme ultraviolet lithography, Refractive index

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Proceedings Article | 16 April 2011 Paper

Paper

Sensitive polysulfone based chain scissioning resists for 193nm lithography

Yong Keng Goh, Lan Chen, Anneke Dorgelo, Xie Peng, Neal Lafferty, Bruce Smith, Paul Zimmerman, Warren Montgomery, Idriss Blakey, Andrew Whittaker

Proceedings Volume 7972, 79722E (2011) https://doi.org/10.1117/12.881700

KEYWORDS: Line edge roughness, Polymers, Absorbance, Water, Sulfur, Scanning electron microscopy, Lithography, Double patterning technology, 193nm lithography, Coating

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Proceedings Article | 30 March 2010 Paper

Paper

Alternatives to chemical amplification for 193nm lithography

Burak Baylav, Meng Zhao, Ran Yin, Peng Xie, Chris Scholz, Bruce Smith, Thomas Smith, Paul Zimmerman

Proceedings Volume 7639, 763915 (2010) https://doi.org/10.1117/12.846924

KEYWORDS: Polymers, Polymethylmethacrylate, Photoresist materials, Etching, Lithography, Resistance, Absorbance, Deep ultraviolet, Photoresist developing, Scanning electron microscopy

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Proceedings Article | 30 March 2010 Paper

Paper

Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance

Lan Chen, Yong-Keng Goh, Kirsten Lawrie, Bruce Smith, Warren Montgomery, Paul Zimmerman, Idriss Blakey, Andrew Whittaker

Proceedings Volume 7639, 76390V (2010) https://doi.org/10.1117/12.846971

KEYWORDS: Polymers, Absorbance, Lithography, Line edge roughness, Polymerization, Optical lithography, Water, Immersion lithography, Semiconducting wafers, Refractive index

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Proceedings Article | 26 March 2010 Paper

Paper

Development of an inorganic photoresist for DUV, EUV, and electron beam imaging

Markos Trikeriotis, Woo Jin Bae, Evan Schwartz, Marie Krysak, Neal Lafferty, Peng Xie, Bruce Smith, Paul Zimmerman, Christopher Ober, Emmanuel Giannelis

Proceedings Volume 7639, 76390E (2010) https://doi.org/10.1117/12.846672

KEYWORDS: Nanoparticles, Photoresist materials, Electron beam lithography, Etching, Hafnium, Resistance, Oxides, Photoresist developing, Deep ultraviolet, Refractive index

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Proceedings Article | 26 March 2010 Paper

Paper

Photobase generator assisted pitch division

Xinyu Gu, Christopher Bates, Younjin Cho, Takanori Kawakami, Tomoki Nagai, Toshiyuki Ogata, Arunkumar Sundaresan, Nicholas Turro, Robert Bristol, Paul Zimmerman, C. Grant Willson

Proceedings Volume 7639, 763906 (2010) https://doi.org/10.1117/12.846395

KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Photoresist materials, Manufacturing, Polymers, Semiconductors, Double patterning technology, Image processing, Interferometry

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Proceedings Article | 4 March 2010 Paper

Paper

High fluence testing of optical materials for 193-nm lithography extensions applications

V. Liberman, S. Palmacci, G. Geurtsen, M. Rothschild, P. Zimmerman

Proceedings Volume 7640, 76402Z (2010) https://doi.org/10.1117/12.853094

KEYWORDS: Thin film coatings, Laser induced fluorescence, Silica, Laser irradiation, Birefringence, Lithography, Absorption, Luminescence, Absorbance, Spectroscopy

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Proceedings Article | 1 April 2009 Paper

Paper

Fundamental study of optical threshold layer approach towards double exposure lithography

Xinyu Gu, Adam Berro, Younjin Cho, Kane Jen, Saul Lee, Tomoki Ngai, Toshiyuki Ogata, William Durand, Arunkumar Sundaresan, Jeffrey Lancaster, Steffen Jockusch, Paul Zimmerman, Nicholas Turro, C. Willson

Proceedings Volume 7273, 72731C (2009) https://doi.org/10.1117/12.814298

KEYWORDS: Polymers, Lithography, Crystals, Diffusion, Temperature metrology, Extreme ultraviolet lithography, Sensors, Polymer thin films, Optical lithography, Photomasks

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Proceedings Article | 1 April 2009 Paper

Paper

Optical threshold layer and intermediate state two-photon PAG approaches to double exposure lithography

Adam Berro, Xinyu Gu, Naphtali O'Connor, Steffen Jockusch, Tomoki Nagai, Toshiyuki Ogata, Paul Zimmerman, Bryan Rice, Elizabeth Adolph, Travis Byargeon, Jose Gonzalez, Nicholas Turro, C. Grant Willson

Proceedings Volume 7273, 72731B (2009) https://doi.org/10.1117/12.814295

KEYWORDS: Polymers, Liquids, Liquid crystals, Crystals, Lithography, Molecules, Absorption, Diffusion, Nitrogen, Absorbance

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Proceedings Article | 1 April 2009 Paper

Paper

Non-CA resists for 193 nm immersion lithography: effects of chemical structure on sensitivity

Idriss Blakey, Lan Chen, Yong-Keng Goh, Kirsten Lawrie, Ya-Mi Chuang, Emil Piscani, Paul Zimmerman, Andrew Whittaker

Proceedings Volume 7273, 72733X (2009) https://doi.org/10.1117/12.814076

KEYWORDS: Polymers, Photons, Immersion lithography, Semiconducting wafers, Absorbance, Polymer thin films, FT-IR spectroscopy, Polymethylmethacrylate, Ionizing radiation, Optical lithography

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Proceedings Article | 1 April 2009 Paper

Paper

High-index nanocomposite photoresist for 193-nm lithography

Woo Jin Bae, Makros Trikeriotis, Robert Rodriguez, Michael Zettel, Emil Piscani, Christopher Ober, Emmanuel Giannelis, Paul Zimmerman

Proceedings Volume 7273, 727326 (2009) https://doi.org/10.1117/12.814154

KEYWORDS: Nanoparticles, Photoresist materials, Refractive index, Water, Ultraviolet radiation, Nanocomposites, Lithography, Immersion lithography, Semiconducting wafers, Absorption

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Proceedings Article | 1 April 2009 Paper

Paper

High refractive index nanoparticle fluids for 193-nm immersion lithography

Markos Trikeriotis, Robert Rodriguez, Michael Zettel, Aristeidis Bakandritsos, Woo Jin Bae, Paul Zimmerman, Christopher Ober, Emmanuel Giannelis

Proceedings Volume 7273, 72732A (2009) https://doi.org/10.1117/12.814408

KEYWORDS: Refractive index, Nanoparticles, Water, Immersion lithography, Hafnium, Particles, Absorption, Oxides, Fluid dynamics, Dynamic light scattering

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Proceedings Article | 16 March 2009 Paper

Paper

High index 193 nm immersion lithography: the beginning or the end of the road

Paul Zimmerman, Bryan Rice, Emil Piscani, Vladimir Liberman

Proceedings Volume 7274, 727420 (2009) https://doi.org/10.1117/12.814381

KEYWORDS: Absorbance, Nanoparticles, Immersion lithography, Lithography, Prisms, Refractive index, Absorption, Water, Crystals, Double patterning technology

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SPIE Journal Paper | 1 January 2009

Materials modeling and development for use in double-exposure lithography applications

Saul Lee, Kane Jen, C. Grant Willson, Jeffrey Byers, Paul Zimmerman, Nicholas Turro

JM3, Vol. 8, Issue 01, 011011, (January 2009) https://doi.org/10.1117/12.10.1117/1.3095589

KEYWORDS: Lithography, Picture Archiving and Communication System, Photomasks, Nonlinear response, Computer simulations, Imaging systems, Photons, Electroluminescence, Photoresist developing, Absorbance

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Proceedings Article | 15 April 2008 Paper

Paper

Options for high index fluids for third generation 193i lithography

Seth Kruger, Srividya Revuru, Shao-Zhong Zhang, Dimitri Vaughn, Eric Block, Paul Zimmerman, Robert Brainard

Proceedings Volume 6923, 69231O (2008) https://doi.org/10.1117/12.772994

KEYWORDS: Absorbance, Refractive index, Water, Sulfur, Oxygen, Refraction, Liquids, Argon, Potassium, Lithography

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Proceedings Article | 15 April 2008 Paper

Paper

Development of an operational high refractive index resist for 193nm immersion lithography

Paul Zimmerman, Jeffrey Byers, Emil Piscani, Bryan Rice, Christopher Ober, Emmanuel Giannelis, Robert Rodriguez, Dongyan Wang, Andrew Whittaker, Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu

Proceedings Volume 6923, 692306 (2008) https://doi.org/10.1117/12.772871

KEYWORDS: Nanoparticles, Refractive index, Absorbance, Immersion lithography, Polymers, Lithography, Chemistry, Chlorine, Sulfur, Line edge roughness

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Proceedings Article | 15 April 2008 Paper

Paper

Development and evaluation of 193nm immersion generation-three fluid candidates

Paul Zimmerman, Jeffrey Byers, Bryan Rice, Christopher Ober, Emmanuel Giannelis, Robert Rodriguez, Dongyan Wang, Naphtali O’Connor, Xuegong Lei, Nicholas Turro, Vladimir Liberman, Stephen Palmacci, Mordechai Rothschild, Neal Lafferty, Bruce Smith

Proceedings Volume 6923, 69230A (2008) https://doi.org/10.1117/12.772887

KEYWORDS: Nanoparticles, Refractive index, Absorbance, Metals, Oxides, Water, Nanocomposites, Transparency, Polarizability, Ultraviolet radiation

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Proceedings Article | 1 April 2008 Paper

Paper

Continuing 193nm optical lithography for 32nm imaging and beyond

Emil Piscani, Dominic Ashworth, Jeff Byers, Chris Van Peski, Paul Zimmerman, Bryan Rice

Proceedings Volume 6924, 69242I (2008) https://doi.org/10.1117/12.775474

KEYWORDS: Prisms, Reflectivity, Photomasks, Semiconducting wafers, Imaging systems, Double patterning technology, Wafer-level optics, Remote sensing, Polarization, Optical lithography

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Proceedings Article | 1 April 2008 Paper

Paper

An analysis of double exposure lithography options

Saul Lee, Jeffrey Byers, Kane Jen, Paul Zimmerman, Bryan Rice, Nicholas Turro, C. Grant Willson

Proceedings Volume 6924, 69242A (2008) https://doi.org/10.1117/12.773030

KEYWORDS: Lithography, Photomasks, Electroluminescence, Optical lithography, Nonlinear response, Semiconducting wafers, Double patterning technology, Imaging systems, Resolution enhancement technologies, Computer simulations

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Proceedings Article | 7 March 2008 Paper

Paper

High-index immersion lithography: preventing lens photocontamination and identifying optical behavior of LuAG

V. Liberman, M. Rothschild, S. Palmacci, R. Bristol, J. Byers, N. J. Turro, X. Lei, N. O'Connor, P. Zimmerman

Proceedings Volume 6924, 692416 (2008) https://doi.org/10.1117/12.771462

KEYWORDS: Contamination, Absorbance, Hydrogen, Microfluidics, Chemical elements, Laser irradiation, Absorption, Immersion lithography, Oxygen, Refractive index

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SPIE Journal Paper | 1 July 2007

Methods for the synthesis and purification of polycycloalkane candidates for photolithography immersion fluids at 193 nm: requirements for removal of oxygen

Juan Lopez Gejo, Joy Kunjappu, Willard Conley, Paul Zimmerman, Nicholas Turro

JM3, Vol. 6, Issue 03, 033003, (July 2007) https://doi.org/10.1117/12.10.1117/1.2778641

KEYWORDS: Oxygen, Absorption, Argon, Microfluidics, Absorbance, Refractive index, Optical lithography, Nitrogen, Molecules, Oxidation

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Proceedings Article | 27 March 2007 Paper

Paper

Laser durability studies of high index immersion fluids: fluid degradation and optics contamination effects

V. Liberman, M. Rothschild, S. Palmacci, P. Zimmerman, A. Grenville

Proceedings Volume 6520, 652035 (2007) https://doi.org/10.1117/12.723958

KEYWORDS: Microfluidics, Contamination, Microfluidic imaging, Water, Metrology, Chemical elements, Oxygen, Immersion lithography, Photochemistry, Absorbance

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Proceedings Article | 22 March 2007 Paper

Paper

Outlook for potential third-generation immersion fluids

Juan López-Gejo, Joy Kunjappu, J. Zhou, B. Smith, Paul Zimmerman, Will Conley, Nicholas Turro

Proceedings Volume 6519, 651921 (2007) https://doi.org/10.1117/12.695536

KEYWORDS: Absorption, Refractive index, Oxygen, Argon, Microfluidics, Absorbance, Nitrogen, Liquids, Optical lithography, Oxidation

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Proceedings Article | 22 March 2007 Paper

Paper

Novel high-index resists for 193-nm immersion lithography and beyond

Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu, Andrew Whittaker, Will Conley, Emil Piscani, Georgia Rich, Alvina Williams, Paul Zimmerman

Proceedings Volume 6519, 651909 (2007) https://doi.org/10.1117/12.715108

KEYWORDS: Polymers, Refractive index, Polymerization, Immersion lithography, Molecules, Absorbance, Nitrogen, Data modeling, Water, Sulfur

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Proceedings Article | 4 May 2005 Paper

Paper

Amplification of the index of refraction of aqueous immersion fluids by ionic surfactants

Kwangjoo Lee, Joy Kunjappu, Steffen Jockusch, Nicholas Turro, Tatjana Widerschpan, Jianming Zhou, Bruce Smith, Paul Zimmerman, Will Conley

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.606105

KEYWORDS: Refraction, Refractive index, Water, Sodium, Cadmium, Luminescence, Optical lithography, Ions, Molecules, Lithography

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Proceedings Article | 4 May 2005 Paper

Paper

Nanocomposite liquids for 193 nm immersion lithography: a progress report

George Chumanov, David Evanoff, Igor Luzinov, Viktor Klep, Bogdan Zdryko, Will Conley, Paul Zimmerman

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601479

KEYWORDS: Refractive index, Particles, Liquids, Nanocomposites, Nanoparticles, Immersion lithography, Water, Aluminum, Absorption, Semiconductors

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Proceedings Article | 4 May 2005 Paper

Paper

High-RI resist polymers for 193 nm immersion lithography

Andrew Whittaker, Idriss Blakey, Heping Liu, David Hill, Graeme George, Will Conley, Paul Zimmerman

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600630

KEYWORDS: Polymers, Refractive index, Sulfur, Data modeling, Immersion lithography, Plasma etching, Sodium, Molecules, Nitrogen, Polymerization

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Proceedings Article | 28 May 2004 Paper

Paper

Production of novel materials for 157-nm and 193-nm soft pellicles

Paul Zimmerman, Chris van Peski, Daniel Miller, Ryan Callahan, Matthew Cashion

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534350

KEYWORDS: Pellicles, Polymers, Transparency, Ultraviolet radiation, Fluorine, Lithography, Electrons, Polymer thin films, Gases, FT-IR spectroscopy

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Proceedings Article | 28 May 2004 Paper

Paper

157-nm pellicles for photolithography: mechanistic investigation of the deep-UV photolysis of fluorocarbons

Kwangjoo Lee, Steffen Jockusch, Nicholas Turro, Roger French, Robert Wheland, Michael Lemon, Andre Braun, Tatjana Widerschpan, Paul Zimmerman

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534381

KEYWORDS: Fluorine, Photolysis, Pellicles, Ultraviolet radiation, FT-IR spectroscopy, Liquids, Polymers, Oxygen, Deep ultraviolet, Optical lithography

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Proceedings Article | 14 May 2004 Paper

Paper

Design of dissolution inhibitors for chemically amplified photolithographic systems

Charles Chambers, Shiro Kusumoto, Brian Osborn, Alok Vasudev, Michitaka Ootani, Leonidas Walthal, Hale McMichael, Paul Zimmerman, Willard Conley, C. Grant Willson

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535941

KEYWORDS: Polymers, Distributed interactive simulations, Absorbance, Photoresist materials, Scanning electron microscopy, Semiconducting wafers, Picture Archiving and Communication System, Glasses, Transparency, Optical lithography

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Proceedings Article | 17 December 2003 Paper

Paper

Passivation of the 157-nm pellicle with nanometer thin films

Yue Kuo, Jiang Lu, Jun-Yen Tewg, Paul Zimmerman

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517506

KEYWORDS: Pellicles, Silicon, Aluminum, Thin films, Polymers, Coating, Contamination, Magnesium, Adsorption, Tin

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Proceedings Article | 12 June 2003 Paper

Paper

Dissolution inhibitors for 157-nm photolithography

Charles Chambers, Shiro Kusumoto, Guen Su Lee, Alok Vasudev, Leonidas Walthal, Brian Osborn, Paul Zimmerman, Will Conley, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485191

KEYWORDS: Polymers, Distributed interactive simulations, Semiconducting wafers, Photoresist materials, Carbon monoxide, Carbonates, Optical lithography, Lithography, Absorbance, Fluorine

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Proceedings Article | 12 June 2003 Paper

Paper

Negative photoresist for 157-nm microlithography: a progress report

Will Conley, Brian Trinque, Daniel Miller, Stefan Caporale, Brian Osborn, Shiro Kumamoto, Matthew Pinnow, Ryan Callahan, Charles Chambers, Guen Su Lee, Paul Zimmerman, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485194

KEYWORDS: Polymers, Photoresist materials, Transparency, Imaging systems, Spectroscopy, Photomasks, Carbon monoxide, Optical lithography, Binary data, Absorbance

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Proceedings Article | 12 June 2003 Paper

Paper

Intel benchmarking and process integration of 157-nm resists

James Powers, Jeanette Roberts, Paul Zimmerman, Robert Meagley, E. Steve Putna, Uday Shah

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483730

KEYWORDS: Etching, Silicon, Line width roughness, Dry etching, Absorbance, Photoresist materials, Imaging systems, Electroluminescence, Optical lithography, Lithography

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Proceedings Article | 12 June 2003 Paper

Paper

Imaging and photochemistry studies of fluoropolymers for 193-nm lithography

Will Conley, Paul Zimmerman, Daniel Miller, Guen Su Lee

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485204

KEYWORDS: Absorbance, Lithography, Photoresist materials, Photochemistry, 193nm lithography, Modulation, Polymers, Transparency, Photoresist developing, Absorption

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Proceedings Article | 12 June 2003 Paper

Paper

Fluoropolymer resists for 157-nm lithography

Vaishali Vohra, Xiang-Qian Liu, Katsuji Douki, Christopher Ober, Will Conley, Paul Zimmerman, Daniel Miller

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485097

KEYWORDS: Polymers, Silicon, Fluorine, Lithography, Transparency, Polymerization, Absorbance, Photoresist materials, Resistance, Scanning electron microscopy

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Proceedings Article | 12 June 2003 Paper

Paper

Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report

Iqbal Sharif, Darryl DesMarteau, Larry Ford, Gregory Shafer, Brian Thomas, Will Conley, Paul Zimmerman, Daniel Miller, Guen Su Lee, Charles Chambers, Brian Trinque, Takashi Chiba, Brian Osborn, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485192

KEYWORDS: Polymers, Absorbance, Etching, Transparency, Resistance, Lithography, Imaging systems, Chemistry, Optical lithography, Carbon monoxide

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Proceedings Article | 24 July 2002 Paper

Paper

Negative photoresist for 157-nm microlithography; a progress report

Will Conley, Brian Trinque, Daniel Miller, Paul Zimmerman, Takanori Kudo, Ralph Dammel, Andrew Romano, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474187

KEYWORDS: Photoresist materials, Polymers, Absorbance, Semiconducting wafers, Spectroscopy, Transparency, Photomasks, Silicon, FT-IR spectroscopy, Optical lithography

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Proceedings Article | 24 July 2002 Paper

Paper

Advances in resists for 157-nm microlithography

Brian Trinque, Brian Osborn, Charles Chambers, Yu-Tsai Hsieh, Schuyler Corry, Takashi Chiba, Raymond Hung, Hoang Tran, Paul Zimmerman, Daniel Miller, Will Conley, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474272

KEYWORDS: Polymers, Absorbance, Transparency, Fluorine, Vacuum ultraviolet, Spectroscopy, Phase shifts, Optical lithography, Carbon monoxide, Silica

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Proceedings Article | 24 July 2002 Paper

Paper

Parameter extraction for 157-nm photoresists

Joseph Bendik, Will Conley, Daniel Miller, Paul Zimmerman, Kim Dean, John Petersen, Jeff Byers

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474174

KEYWORDS: Lithography, Photoresist materials, Data modeling, Absorption, Systems modeling, FT-IR spectroscopy, Metrology, Transparency, Scanning electron microscopy, Opacity

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Proceedings Article | 24 July 2002 Paper

Paper

Dissolution inhibitors for 157-nm microlithography

Will Conley, Daniel Miller, Charles Chambers, Brian Osborn, Raymond Hung, Hoang Tran, Brian Trinque, Matthew Pinnow, Takashi Chiba, Scott McDonald, Paul Zimmerman, Ralph Dammel, Andrew Romano, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474282

KEYWORDS: Polymers, Absorbance, Photoresist materials, Imaging systems, Lithography, Semiconducting wafers, Transparency, Optical lithography, Vacuum ultraviolet, Phase measurement

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Proceedings Article | 24 July 2002 Paper

Paper

Highly transparent resist platforms for 157-nm microlithography: an update

Vaishali Vohra, Katsuji Douki, Young-Je Kwark, Xiang-Qian Liu, Christopher Ober, Young Bae, Will Conley, Daniel Miller, Paul Zimmerman

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474169

KEYWORDS: Polymers, Fluorine, Transparency, Polymerization, Etching, Lithography, Resistance, Absorbance, Scanning electron microscopy, Photoresist materials

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Showing 5 of 42 publications

Conference Committee Involvement (3)

Advances in Resist Materials and Processing Technology XXVII

22 February 2010 | San Jose, California, United States

Advances in Resist Technology and Processing XXI

23 February 2004 | Santa Clara, California, United States

Advances in Resist Technology and Processing XX

24 February 2003 | Santa Clara, California, United States

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