Dr. Paul A. Zimmerman
Soft Pellicle Project Manager at Intel Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (42)

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Polymers, Water, Sulfur, Coating, Scanning electron microscopy, Absorbance, Double patterning technology, Line edge roughness, 193nm lithography

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Oxides, Lithography, Electron beam lithography, Refractive index, Nanoparticles, Etching, Resistance, Photoresist materials, Extreme ultraviolet lithography, Hafnium

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Polymethylmethacrylate, Deep ultraviolet, Etching, Polymers, Resistance, Scanning electron microscopy, Photoresist materials, Absorbance, Photoresist developing

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Refractive index, Optical lithography, Polymers, Water, Polymerization, Absorbance, Immersion lithography, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Semiconductors, Lithography, Polymers, Image processing, Manufacturing, Interferometry, Photoresist materials, Photomasks, Double patterning technology, Critical dimension metrology

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Oxides, Electron beam lithography, Refractive index, Deep ultraviolet, Nanoparticles, Etching, Resistance, Photoresist materials, Hafnium, Photoresist developing

Showing 5 of 42 publications
Conference Committee Involvement (3)
Advances in Resist Materials and Processing Technology XXVII
22 February 2010 | San Jose, California, United States
Advances in Resist Technology and Processing XXI
23 February 2004 | Santa Clara, California, United States
Advances in Resist Technology and Processing XX
24 February 2003 | Santa Clara, California, United States
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