Dr. Paul van Adrichem
Mask Synthesis CAE Manager at ASML Netherlands BV
SPIE Involvement:
Author
Publications (42)

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Diffraction, Phase modulation, Metals, Phase shift keying, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Reticles, Logic, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Semiconducting wafers

Proceedings Article | 26 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Photomasks, Extreme ultraviolet lithography, Immersion lithography, Source mask optimization, Optimization (mathematics), Fiber optic illuminators

Proceedings Article | 28 April 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Signal to noise ratio, Metrology, Optical lithography, Data modeling, Calibration, Metals, Image analysis, Optical proximity correction, OLE for process control, Instrument modeling

Showing 5 of 42 publications
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