Dr. Paul van Adrichem
Mask Synthesis CAE Manager at ASML Netherlands BV
SPIE Involvement:
Author
Publications (45)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Diffraction, Extreme ultraviolet lithography, Metals, Photomasks, Semiconducting wafers, Nanoimprint lithography, Optical proximity correction, Extreme ultraviolet, Phase modulation, Phase shift keying

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Metrology, Extreme ultraviolet, Stochastic processes

Showing 5 of 45 publications
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