Paul A. W. van der Heide
at imec
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 1 May 2023 Presentation + Paper
Laura Galleni, Faegheh Sajjadian, Thierry Conard, Ivan Pollentier, Kevin Dorney, Fabian Holzmeier, Esben Witting Larsen, Daniel Escudero, Geoffrey Pourtois, Michiel van Setten, Paul van der Heide, John Petersen
Proceedings Volume 12498, 124980W (2023) https://doi.org/10.1117/12.2660047
KEYWORDS: X-ray photoelectron spectroscopy, Extreme ultraviolet lithography, Photoacid generators, Ultrafast phenomena, X-rays, Photoresist materials, Quantum processes, Extreme ultraviolet, Lithography, Stochastic processes

Proceedings Article | 1 May 2023 Presentation + Paper
Marziogiuseppe Gentile, Marius Gerlach, Robert Richter, Michiel van Setten, John Petersen, Paul van der Heide, Fabian Holzmeier
Proceedings Volume 12498, 124980S (2023) https://doi.org/10.1117/12.2657702
KEYWORDS: Ions, Electrons, Extreme ultraviolet, Photons, Extreme ultraviolet lithography, Photoresist materials, Ionization, Molecules, Chemistry

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 1249407 (2023) https://doi.org/10.1117/12.2658359
KEYWORDS: Extreme ultraviolet, Photoresist materials, Reflectometry, Extreme ultraviolet lithography, Optical constants, Interfaces

Proceedings Article | 22 February 2021 Presentation
Fabian Holzmeier, Kevin Dorney, Esben Larsen, Thomas Nuytten, Dhirendra Singh, Michiel van Setten, Pieter Vanelderen, Clayton Bargsten, Seth Cousin, Daisy Raymondson, Eric Rinard, Rod Ward, Henry Kapteyn, Stefan Böttcher, Oleksiy Dyachenko, Raimund Kremzow, Marko Wietstruk, Geoffrey Pourtois, Paul van der Heide, John Petersen
Proceedings Volume 11610, 1161010 (2021) https://doi.org/10.1117/12.2595038
KEYWORDS: Lithography, Extreme ultraviolet lithography, Ultrafast phenomena, Photoemission spectroscopy, Coherence imaging, Semiconducting wafers, Radiometry, Extreme ultraviolet, Time resolved spectroscopy, Spectroscopy

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11610, 1161011 (2021) https://doi.org/10.1117/12.2595048
KEYWORDS: Lithography, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Ultrafast phenomena, Photoresist materials, Yield improvement, Semiconductor manufacturing, Semiconducting wafers, Scanning electron microscopy

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