Paul A. Llanos
Process Engineer at
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Data mining, Metrology, Statistical analysis, Data modeling, Manufacturing, Diagnostics, Time metrology, Process control, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 10, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Metrology, Visualization, Etching, Metals, Quality measurement, Scanning electron microscopy, Process control, Semiconducting wafers, Back end of line

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