Pavan Yadav Bashaboina
Staff Research Engineer at IBM India Pvt Ltd
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | May 20, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Computer simulations, SRAF, Electronic design automation, Resolution enhancement technologies, Current controlled current source

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