Dr. Pavel Izikson
at KLA Israel
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Semiconductors, Metrology, Data modeling, Numerical simulations, Data processing, Process control, Semiconductor manufacturing, Semiconducting wafers, Overlay metrology, Instrument modeling

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Mathematical modeling, Lithography, Metrology, Optical lithography, Data modeling, Photomasks, Double patterning technology, Semiconducting wafers, Statistical modeling, Overlay metrology

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Scanners, Distortion, Image registration, Pellicles, Distance measurement, Photomasks, Double patterning technology, Semiconducting wafers, Overlay metrology

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Data modeling, Scanners, Error analysis, Control systems, Scatterometry, Finite element methods, Neural networks, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 23 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Control systems, Monte Carlo methods, Time metrology, Process control, Immersion lithography, Statistical methods, Semiconducting wafers, Overlay metrology

Showing 5 of 20 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top