Pavel Nesládek
Member of Technical Staff at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Publications (27)

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Etching, Ultraviolet radiation, Manufacturing, Reflectivity, Atomic force microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Photomasks, Electrochemical etching, Phase shifts

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Mirrors, Etching, Manufacturing, Photomasks, Extreme ultraviolet, Critical dimension metrology, Optics manufacturing, Ruthenium, EUV optics

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Etching, Quartz, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Optics manufacturing, Ruthenium, Mask cleaning, EUV optics

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Mirrors, Etching, Ions, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Optics manufacturing, Ruthenium, EUV optics

Showing 5 of 27 publications
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