We simulate impulse propagation in all-optical temporal integrator based on a photonic crystal nanobeam cavity. This cavity (6 x 0.5 μm) is tens times smaller in size than Bragg grating or microring resonator proposed as an optical integrator earlier. The demonstrate good correspondence between numerical and analytical results.
This research article contains an experiment with implementation of image filtering task in Apache Storm and IBM InfoSphere Streams stream data processing systems. The aim of presented research is to show that new technologies could be effectively used for sliding window filtering of image sequences. The analysis of execution was focused on two parameters: throughput and memory consumption. Profiling was performed on CentOS operating systems running on two virtual machines for each system. The experiment results showed that IBM InfoSphere Streams has about 1.5 to 13.5 times lower memory footprint than Apache Storm, but could be about 2.0 to 2.5 slower on a real hardware.
We propose and investigate a complex hyperspectral image classification method with regard to the spatial proximity of pixels. Key feature of the method is that it uses common and relatively simple algorithms to attain high accuracy. The method combines the results of pixel-wise support vector machine classification and a set of contours derived from kmeans++ image clustering. To prevent redundant processing of similar data a principal component analysis is used. The method proposed enables the accuracy and speed of hyperspectral image classification to be enhanced.
We propose and numerically investigate an all-optical temporal integrator based on a photonic crystal nanobeam cavity. We show that an array of photonic crystal cavities enables high-order temporal integration.
Potentialities of the computational experiment when studying focusing elements for laser light are analyzed. We substantiate the need for the computational experiment when choosing a method for solving ill-posed inverse problems of the diffraction theory and analyzing new types of elements to focus laser light, the feasibility and efficiency of the optical elements under predetermined physical parameters of an optical system.
The formation of contact holes in semiconductor integrated circuit device fabrication is considered. The contact holes size usually corresponds to the resolution of the stepper. The vortex mask technique is intended to improve resolution in patterning contact holes through exposure. By adopting this technique, an isolated contact hole with a diameter of approximately 80 nm and 250 nm pitch can be formed with KrF, NA=0.63. The conventional vortex mask approach permits the single exposure printing of regular arrays of contact holes. The unwanted contact holes should be erased from resist pattern by exposing the wafer with a second, conventional trim mask. The double exposure process makes the fabrication more expensive. In the present work the vortex mask for single exposure printing of irregular arrays of contact holes is suggested.