Dr. Pawitter J. Mangat
Director -Global Supplier Quality at Globalfoundries Inc
SPIE Involvement:
Publications (58)

Proceedings Article | 16 October 2017 Presentation + Paper
Proceedings Volume 10450, 1045008 (2017) https://doi.org/10.1117/12.2280371
KEYWORDS: Extreme ultraviolet, Photomasks, Microscopes, Extreme ultraviolet lithography, 3D metrology, Reflectivity, Optical lithography, Image analysis, Image segmentation, Lithography

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10143, 101431T (2017) https://doi.org/10.1117/12.2258393
KEYWORDS: Reticles, Extreme ultraviolet lithography, Contamination, Atmospheric particles, Extreme ultraviolet, Air contamination, Carbon, Reflectivity, Optical lithography, Pellicles, Ions, Ruthenium

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10143, 101430K (2017) https://doi.org/10.1117/12.2260053
KEYWORDS: Photomasks, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet, Printing, Bridges, Extreme ultraviolet lithography, Inspection, Chromium, Atomic force microscopy

SPIE Journal Paper | 28 June 2016
JM3, Vol. 15, Issue 02, 023508, (June 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.023508
KEYWORDS: Zernike polynomials, Extreme ultraviolet lithography, Extreme ultraviolet, Monochromatic aberrations, Imaging systems, Photomasks, Wavefronts, Metrology, Microscopes, Statistical analysis

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 977618 (2016) https://doi.org/10.1117/12.2219745
KEYWORDS: Principal component analysis, Extreme ultraviolet lithography, Metrology, Extreme ultraviolet, Image processing, Systems modeling, Photomasks, Data modeling, Lithography, Interferometry, Monochromatic aberrations, Computer simulations, Detection and tracking algorithms, Semiconductors

Showing 5 of 58 publications
Conference Committee Involvement (10)
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Showing 5 of 10 Conference Committees
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