Dr. Pawitter Mangat
Deputy Director -EUVL at GLOBALFOUNDRIES Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (58)

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Extreme ultraviolet, Photomasks, Microscopes, Extreme ultraviolet lithography, 3D metrology, Reflectivity, Optical lithography, Image analysis, Image segmentation, Lithography

Proceedings Article | 27 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reticles, Extreme ultraviolet lithography, Contamination, Atmospheric particles, Extreme ultraviolet, Air contamination, Carbon, Reflectivity, Optical lithography, Pellicles, Ions, Ruthenium

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Photomasks, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet, Printing, Bridges, Extreme ultraviolet lithography, Inspection, Chromium, Atomic force microscopy

SPIE Journal Paper | 28 June 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Zernike polynomials, Extreme ultraviolet lithography, Extreme ultraviolet, Monochromatic aberrations, Imaging systems, Photomasks, Wavefronts, Metrology, Microscopes, Statistical analysis

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Principal component analysis, Extreme ultraviolet lithography, Metrology, Extreme ultraviolet, Image processing, Systems modeling, Photomasks, Data modeling, Lithography, Interferometry, Monochromatic aberrations, Computer simulations, Detection and tracking algorithms, Semiconductors

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reflectivity, Extreme ultraviolet, Photomasks, Interfaces, Optical coatings, Multilayers, Lithography, Reflectors, Silicon, Ruthenium, Extreme ultraviolet lithography, Molybdenum, Neodymium

Showing 5 of 58 publications
Conference Committee Involvement (10)
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Showing 5 of 10 published special sections
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