Mr. Pedro P. Herrera Profile

Pedro P. Herrera

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 26 March 2019 Presentation + Paper

Presentation + Paper

Process drift compensation by tunable wavelength homing in scatterometry-based overlay

Kun Gao, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Abhishek Gottipati

Proceedings Volume 10959, 1095906 (2019) https://doi.org/10.1117/12.2514548

KEYWORDS: Overlay metrology, Scatterometry, Process control

Read Abstract +

Proceedings Article | 26 March 2019 Paper

Paper

Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Pedro Herrera, Kun Gao, Vidya Ramanathan, Chen Dror, Victoria Naipak, Renan Milo, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Abhishek Gottipati, Yue Zhou, Tal Yaziv, Eitan Hajaj, Raviv Yohanan, Alon Alexander Volfman

Proceedings Volume 10959, 1095928 (2019) https://doi.org/10.1117/12.2514725

KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry

Read Abstract +

Proceedings Article | 28 March 2017 Paper

Paper

SAQP pitch walk metrology using single target metrology

Franz Zach, Fang Fang, Pedro Herrera, Janay Camp, Taher Kagalwala, Alok Vaid, Stilian Pandev

Proceedings Volume 10145, 101452R (2017) https://doi.org/10.1117/12.2261620

KEYWORDS: Metrology, Process control, Critical dimension metrology, Scatterometry, Optical lithography, Scanning electron microscopy, Scanners, Lithography, Etching, Semiconducting wafers, Diffractive optical elements

Read Abstract +

Proceedings Article | 24 March 2016 Paper

Paper

Root cause analysis of overlay metrology excursions with scatterometry overlay technology (SCOL)

Karsten Gutjahr, Dongsuk Park, Patrick Snow, Richard McGowan, Yue Zhou, Tal Marciano, Tal Itzkovich, Michael Adel, Pedro Herrera, Vidya Ramanathan, Janay Camp, Winston Cho, Ki Cheol Ahn

Proceedings Volume 9778, 97781M (2016) https://doi.org/10.1117/12.2219668

KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Diffractive optical elements, Metrology, Photovoltaics, Etching, Detection and tracking algorithms, Signal processing, Optical properties

Read Abstract +

Proceedings Article | 2 April 2014 Paper

Paper

Lithography focus/exposure control and corrections to improve CDU at post etch step

Young Ki Kim, Jie Gao, Mark Yelverton, John Tristan, Joungchel Lee, Karsten Gutjahr, Ching-Hsiang Hsu, Hong Wei, Lester Wang, Chen Li, Lokesh Subramany, Woong Jae Chung, Jeong Soo Kim, Vidya Ramanathan, LipKong Yap, Ram Karur-Shanmugam, Anna Golotsvan, Pedro Herrera, Kevin Huang, Bill Pierson

Proceedings Volume 9050, 90501Y (2014) https://doi.org/10.1117/12.2045433

KEYWORDS: Semiconducting wafers, Etching, Lithography, Finite element methods, Scatterometry, Critical dimension metrology, Factory automation, Scanners, High volume manufacturing, Scatter measurement

Read Abstract +

Proceedings Article | 10 April 2013 Paper

Paper

Lithography focus/exposure control and corrections to improve CDU

Young Ki Kim, Mark Yelverton, Joungchel Lee, Jerry Cheng, Hong Wei, Jeong Soo Kim, Karsten Gutjahr, Jie Gao, Ram Karur-Shanmugam, Pedro Herrera, Kevin Huang, Roie Volkovich, Bill Pierson

Proceedings Volume 8681, 86811P (2013) https://doi.org/10.1117/12.2011534

KEYWORDS: Semiconducting wafers, Finite element methods, Lithography, Scatterometry, Critical dimension metrology, Scanners, Factory automation, Scatter measurement, Metrology, Process control

Read Abstract +

Proceedings Article | 2 April 2010 Paper

Paper

Use of multiple azimuthal angles to enable advanced scatterometry applications

Michelle Zhang, Ted Dziura, Arun Srivatsa, Matthew Sendelbach, Alok Vaid, Pedro Herrera

Proceedings Volume 7638, 76381G (2010) https://doi.org/10.1117/12.846692

KEYWORDS: Metals, Scatterometry, Silicon, Transmission electron microscopy, Metrology, Semiconducting wafers, Critical dimension metrology, Data modeling, Back end of line, Semiconductors

Read Abstract +

Proceedings Article | 22 March 2008 Paper

Paper

Characterization of 32nm node BEOL grating structures using scatterometry

Alok Vaid, Matthew Sendelbach, Matthew Angyal, Shahin Zangooie, Pedro Herrera, Itty Matthew, Charles Archie

Proceedings Volume 6922, 69220S (2008) https://doi.org/10.1117/12.773088

KEYWORDS: Copper, Scatterometry, Back end of line, Metals, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization, Metrology, Inspection, Dielectrics

Read Abstract +

Proceedings Article | 22 March 2008 Paper

Paper

Assessing scatterometry for measuring advanced spacer structures with embedded SiGe

Shahin Zangooie, Matthew Sendelbach, Jingmin Leng, InKyo Kim, Alok Vaid, Pedro Herrera

Proceedings Volume 6922, 69220R (2008) https://doi.org/10.1117/12.774823

KEYWORDS: Transmission electron microscopy, Semiconducting wafers, Deep ultraviolet, Single crystal X-ray diffraction, Ultraviolet radiation, Oxides, Scatterometry, UV optics, Metrology, Scatter measurement

Read Abstract +

Proceedings Article | 6 April 2007 Paper

Paper

Enabling gate etch process development using scatterometry

Pedro Herrera, Jophy Koshy, Matthew Sendelbach

Proceedings Volume 6518, 65184X (2007) https://doi.org/10.1117/12.716723

KEYWORDS: Scatterometry, Scatter measurement, Semiconducting wafers, Etching, Metrology, Calibration, Critical dimension metrology, Plasma etching, Error analysis, Oxides

Read Abstract +

Proceedings Article | 5 April 2007 Paper

Paper

Characterization of capacitive 3D deep trench mask open structures using scatterometry

Matthew Sendelbach, Abebe Mesfin, Shahin Zangooie, Pedro Herrera, Chas Archie

Proceedings Volume 6518, 651827 (2007) https://doi.org/10.1117/12.712763

KEYWORDS: Scatterometry, Silicon, Metrology, Semiconducting wafers, Critical dimension metrology, Photomasks, 3D metrology, Scatter measurement, Scanning electron microscopy, Etching

Read Abstract +

Proceedings Article | 5 April 2007 Paper

Paper

Predicting electrical measurements by applying scatterometry to complex spacer structures

Matthew Sendelbach, Javier Ayala, Pedro Herrera

Proceedings Volume 6518, 651825 (2007) https://doi.org/10.1117/12.714870

KEYWORDS: Scatterometry, Error analysis, Scatter measurement, Resistance, Semiconducting wafers, Oxides, Transistors, Picosecond phenomena, Data modeling, Control systems

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Paper

Improving STI etch process development by replacing XSEM metrology with scatterometry

Pedro Herrera, Matthew Sendelbach, Andres Munoz

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600880

KEYWORDS: Silicon, Scatterometry, Calibration, Etching, Scatter measurement, Semiconducting wafers, Metrology, Critical dimension metrology, Laser induced breakdown spectroscopy, Error analysis

Read Abstract +

Proceedings Article | 24 May 2004 Paper

Paper

Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis

Pedro Herrera, Charles Archie, Matt Hankinson, Hideaki Nii, Matthew Sendelbach, Jason Mayer, Bill Banke

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.538009

KEYWORDS: Scatterometry, Semiconducting wafers, Scatter measurement, Scanning electron microscopy, Critical dimension metrology, Metrology, Manufacturing, Electrodes, Data modeling, Capacitance

Read Abstract +

Proceedings Article | 16 July 2002 Paper

Paper

Spectral scatterometry for 2D trench metrology of low-K dual-damascene interconnect

Marco Guevremont, Mak Kulkarni, Pedro Herrera, Kamal Bhatia, Umar Whitney, Suresh Lakkapragada, Karen Kirmse, Vladimir Ukraintsev, Christopher Baum

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473457

KEYWORDS: Scatterometry, Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Silicon, Metrology, Dielectrics, Reactive ion etching, Semiconducting wafers

Read Abstract +

Proceedings Article | 22 August 2001 Paper

Paper

Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization

Umar Whitney, Mark Drew, Marco Guevremont, David Benoit, John Allgair, Lloyd Litt, Suresh Lakkapragada, Robert Hershey, Pedro Herrera, Ady Levy

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436771

KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Process control, Spectroscopy, Spectroscopes, Metrology, Precision measurement, Control systems

Read Abstract +

Proceedings Article | 8 June 1998 Paper

Paper

SPC tracking and run monitoring of a CD SEM

Dustin Ruehle, John Allgair, John Miller, Pedro Herrera, Richard Elliott

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308732

KEYWORDS: Critical dimension metrology, Line scan image sensors, Scanning electron microscopy, Semiconducting wafers, Manufacturing, Contamination, Diagnostics, Time metrology, Calibration, Semiconductor manufacturing

Read Abstract +

Proceedings Article | 7 July 1997 Paper

Paper

Alternative method for monitoring an in-line CD SEM

Pedro Herrera, Susan Dick, John Allgair

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275948

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Contamination, Manufacturing, Semiconductor manufacturing, Semiconductors, Electron microscopes, Process control, Imaging systems

Read Abstract +

Showing 5 of 18 publications

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement