Pei-Chun Lin
SPIE Involvement:
Author
Publications (3)

SPIE Journal Paper | 22 August 2018
JM3 Vol. 17 Issue 03
KEYWORDS: Computer programming, Electron beam direct write lithography, Raster graphics, Electron beam lithography, Image compression, Logic, Detection and tracking algorithms, Semiconducting wafers, Data compression, Data processing

SPIE Journal Paper | 22 December 2014
JM3 Vol. 14 Issue 01
KEYWORDS: Diffusion, Source mask optimization, Resolution enhancement technologies, Optical proximity correction, Convolution, Photoresist materials, Principal component analysis, SRAF, Matrices, Fiber optic illuminators

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Diffusion, Convolution, 3D modeling, Matrices, Photoresist materials, Partial differential equations, 3D image processing, Immersion lithography, Lithography, Photomasks

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