Dr. Peng Liu
Synopsys Fellow at Synopsys Inc.
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 25 March 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Computer simulations, 3D modeling, Computational lithography, Optical proximity correction, Photoresist processing, Semiconducting wafers

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Finite-difference time-domain method, Deep ultraviolet, Reflectivity, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Data modeling, Diffusion, Computer simulations, 3D modeling, Photomasks, Optical proximity correction, Semiconducting wafers, Performance modeling, 3D image processing

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Semiconductors, Lithography, Diffraction, Finite-difference time-domain method, Optical lithography, 3D modeling, Image filtering, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Scanners, Computer simulations, Transform theory, Process control, Software development, Photomasks, Critical dimension metrology, Optimization (mathematics)

Showing 5 of 9 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top