Peng Yu
at Univ of Texas at Austin
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Photomasks, SRAF, Lithography, Optical proximity correction, Semiconducting wafers, Binary data, Resolution enhancement technologies, Mathematical modeling, Berkelium, Manufacturing

SPIE Journal Paper | 1 July 2007
JM3 Vol. 6 Issue 03
KEYWORDS: Optical proximity correction, Lithography, Photomasks, Calibration, Critical dimension metrology, Photoresist materials, Convolution, Systems modeling, Data modeling, Image processing

Proceedings Article | 28 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Critical dimension metrology, Optical proximity correction, Lithography, Cesium, Detection and tracking algorithms, Manufacturing, Photoresist materials, Computer simulations, Photomasks, Image processing

Proceedings Article | 14 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Optical proximity correction, Computer simulations, Artificial intelligence, Image analysis, Systems modeling, Critical dimension metrology, Finite element methods, Lithographic illumination, Binary data

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