Dr. Peter J. de Groot
Executive Director of R&D at Zygo Corporation
SPIE Involvement:
Board of Directors | Conference Program Committee | Conference Chair | Editorial Board Member: Optical Engineering | Author | Editor | Instructor
Area of Expertise:
Interferometry , Optical metrology , Intellectual property protection , R&D management , Science education
Profile Summary

Peter is a Physics PhD specializing in applied optics. Peter has published 150 technical papers, tutorials and book chapters in the fields of physics, optical testing, surface structure analysis, semiconductor wafer process metrology, stage motion measurement, international standards for metrology, and large-scale coordinate measurement. His research has led to 135 US patents and several commercial products. He is a Fellow of the SPIE and of the Optical Society of America, an Honorary Professor at the University of Nottingham, winner of the Rudolf Kingslake medal, a multiple award winner for innovation, a conference organizer and active contributor in the optics community
Publications (45)

SPIE Journal Paper | 27 June 2020
OE Vol. 59 Issue 06
KEYWORDS: Data acquisition, Cameras, Signal to noise ratio, Interference (communication), Phase shifts, Optical components, Optical engineering, Microscopes, Image filtering, Standards development

Proceedings Article | 1 April 2020
Proc. SPIE. 11352, Optics and Photonics for Advanced Dimensional Metrology
KEYWORDS: Signal to noise ratio, Modeling, Spatial frequencies, Scattering, Interferometers, 3D metrology, Surface quality testing, Diffraction gratings

Proceedings Article | 1 April 2020
Proc. SPIE. 11352, Optics and Photonics for Advanced Dimensional Metrology
KEYWORDS: Diamond turning, Metrology, Lenses, Calibration, Interferometry, Optical testing, Aspheric lenses, High volume manufacturing, Surface finishing, Fizeau interferometers

Proceedings Article | 3 September 2019
Proc. SPIE. 11102, Applied Optical Metrology III
KEYWORDS: Diffraction, Point spread functions, Imaging systems, Spatial frequencies, Interferometers, Reflectivity, Interferometry, 3D modeling, 3D metrology, Modulation transfer functions

Proceedings Article | 3 September 2019
Proc. SPIE. 11102, Applied Optical Metrology III
KEYWORDS: Microscopes, Optical filters, Sensors, Calibration, Scanners, Microscopy, Error analysis, Manufacturing, Capacitance, Standards development

Showing 5 of 45 publications
Proceedings Volume Editor (3)

SPIE Conference Volume | 16 April 2020

SPIE Conference Volume | 16 July 2014

Conference Committee Involvement (39)
Optical Manufacturing and Testing XIII
25 August 2020 | Online Only, California, United States
Interferometry XX
25 August 2020 | Online Only, California, United States
Optics and Photonics for Advanced Dimensional Metrology
6 April 2020 | Online Only, France
Applied Optical Metrology III
13 August 2019 | San Diego, California, United States
Optical Measurement Systems for Industrial Inspection XI
24 June 2019 | Munich, Germany
Showing 5 of 39 Conference Committees
Course Instructor
SC1271: Optical measurement of surface topography
Optical measurement plays an important role in non-contact strategies for 3D visualization and quantification of surface topography. The dominant techniques today involve imaging microscopy combined with confocal, focus-variation, quantitative phase imaging, digital holographic or interferometric principles to achieve sensitivity to height variations in the object surface. In this tutorial, we will review the fundamentals of these advanced techniques, including principles, implementation and best practice examples of applications and data interpretation. We will then move on to interference microscopy as an illustrative example of the current state of the art. Hot topics include performance enhancements, new objective designs for wide-field imaging, vibration robustness, accommodation of highly sloped surfaces, correlation to contact methods, metrology for additive manufacturing, and transparent surface films characterization. We will also consider the impact and importance of calibration, surface texture parameters, and standardization. Finally, a gallery of applications illustrates the current state of the art as well as the future potential for optical methods of surface structure analysis.
SC795: Interference Microscopy
We begin with a review of the principles of interferometry using language and visuals accessible to a broad audience. A survey of instruments takes us from early Fizeau interferometers to automated phase shifting systems and finally to vertically scanned white-light interferometers—presently the most widely used microscope for general-purpose profiling. We then advance to modern principles of interference microscopy, including mathematical modeling, analysis of complex surface structures, thin films and dynamic measurements. Armed with this background, we proceed to applications, data interpretation and presentation, supported by a gallery of examples including automotive parts, flat panel displays, data storage and MEMS devices, aspheric optics and semiconductor wafers.
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top