Dr. Peter D. Brooker
Litho Modeling Engineer at Synopsys Inc
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (24)

Proceedings Article | 21 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, 3D modeling, Photoresist materials, Photoresist developing

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Data modeling, Calibration, 3D modeling, Printing, Photomasks, Machine learning, Optical proximity correction, Semiconducting wafers

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Lithographic illumination, Cadmium, Calibration, Error analysis, 3D modeling, Photomasks, Semiconducting wafers, Process modeling, Light

Proceedings Article | 18 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Reticles, Metrology, Data modeling, Manufacturing, Feature extraction, Scanning electron microscopy, Dysprosium, Optical proximity correction, Semiconducting wafers, Data analysis

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes

Showing 5 of 24 publications
Conference Committee Involvement (4)
Optical Microlithography XXVIII
24 February 2015 | San Jose, California, United States
Optical Microlithography XXVII
25 February 2014 | San Jose, California, United States
Optical Microlithography XXVI
26 February 2013 | San Jose, California, United States
Optical Microlithography XXV
14 February 2012 | San Jose, California, United States
Course Instructor
SC707A: Basics of Optical Imaging in Microlithography: A Hands-On Approach
A basic 'hands on' lecture is presented, in which students are given various optical components, including a source, lenses, gratings, etc., that are used to build a personal optical bench. Basic concepts of imaging, resolution, coherence factor, on-axis illumination, off-axis illumination, binary masks, phase-shift masks, etc., are examined by the students operating in small groups under the direction of the instructor. These concepts are related to real lithographic systems using basic principles and simulation. This course is intended to provide a foundation for the follow-on course, "Imaging and Optics Fundamentals in Microlithography" (SC706).
SC707: Basics of Optical Imaging in Microlithography: A Hands-on Approach
A basic 'hands on' lecture is presented, in which students are given various optical components, including a source, lenses, gratings, etc., that are used to build a personal optical bench. Basic concepts of imaging, resolution, coherence factor, on-axis illumination, off-axis illumination, binary masks, phase-shift masks, etc., are examined by the students operating in small groups under the direction of the instructor. These concepts are related to real lithographic systems using basic principles and simulation. This course is intended to provide a foundation for the follow-on course, "Imaging and Optics Fundamentals in Microlithography" (SC706).
SC707B: Basics of Optical Imaging in Microlithography: A Hands-On Approach
A basic 'hands on' lecture is presented, in which students are given various optical components, including a source, lenses, gratings, etc., that are used to build a personal optical bench. Basic concepts of imaging, resolution, coherence factor, on-axis illumination, off-axis illumination, binary masks, phase-shift masks, etc., are examined by the students operating in small groups under the direction of the instructor. These concepts are related to real lithographic systems using basic principles and simulation. This course is intended to provide a foundation for the follow-on course, "Imaging and Optics Fundamentals in Microlithography" (SC706).
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