Peter Buck
Retired at Siemens EDA
SPIE Involvement:
Track Chair | Author | Editor
Area of Expertise:
Photomasks , OPC , Lithography Simulation
Websites:
Publications (85)

Proceedings Article | 1 November 2022 Paper
Ingo Bork, Peter Buck, Kushlendra Mishra, Rachit Sharma, Mary Zuo
Proceedings Volume 12472, 124720S (2022) https://doi.org/10.1117/12.2640001
KEYWORDS: Scattering, Calibration, Manufacturing, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Process modeling

Proceedings Article | 16 September 2022 Paper
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, Sanghee Lee, Peter Buck, Bhardwaj Durvasula, Sayalee Gharat, Vlad Liubich
Proceedings Volume 12325, 1232508 (2022) https://doi.org/10.1117/12.2641557
KEYWORDS: Optical lithography, Photomasks, Extreme ultraviolet, Optical proximity correction, Mask making

SPIE Journal Paper | 1 November 2021 Open Access
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, JoonSoo Park, Peter Buck, Ingo Bork, Bhardwaj Durvasula, Sayalee Gharat, Nageswara Rao, Ravi Pai, Sandeep Koranne, Alexander Tritchkov
JM3, Vol. 20, Issue 04, 041403, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041403
KEYWORDS: Photomasks, Tolerancing, Optical proximity correction, Semiconducting wafers, Manufacturing, Extreme ultraviolet, Vestigial sideband modulation, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography

Proceedings Article | 22 October 2021 Presentation + Paper
Ingo Bork, Peter Buck, Bhardwaj Durvasula, Vlad Liubich, Nageswara Rao, Rachit Sharma, Mary Zuo
Proceedings Volume 11855, 118550R (2021) https://doi.org/10.1117/12.2601032
KEYWORDS: Lithography, Image segmentation, Data processing, Solids, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Tolerancing, Data corrections

Proceedings Article | 12 October 2021 Presentation + Paper
Proceedings Volume 11855, 118550Z (2021) https://doi.org/10.1117/12.2600926
KEYWORDS: Metrology, Data modeling, Calibration, Error analysis, Scanning electron microscopy, Photomasks, Critical dimension metrology, Statistical modeling, Process modeling

Showing 5 of 85 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 5 December 2017

SPIE Conference Volume | 8 December 2016

Conference Committee Involvement (15)
Photomask Technology
27 September 2021 | Online Only, United States
Photomask Technology
21 September 2020 | Online Only, California, United States
Photomask Technology
16 September 2019 | Monterey, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Showing 5 of 15 Conference Committees
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