Mr. Peter Buck
Director Marketing-Calibre MDP/MPC at Mentor Graphics Corp
SPIE Involvement:
Conference Program Committee | Conference Chair | Conference Co-Chair | Editor | Author
Area of Expertise:
Photomasks , OPC , Lithography Simulation
Websites:
Publications (71)

SPIE Conference Volume | December 5, 2017

PROCEEDINGS ARTICLE | October 31, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Data modeling, Calibration, Photomasks, Optical proximity correction, Mask making, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Lithography, Calibration, Manufacturing, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Optical calibration, Model-based design

SPIE Conference Volume | December 8, 2016

PROCEEDINGS ARTICLE | October 25, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Germanium, Computing systems, Printing, Data processing, Distributed computing, Photomasks, Raster graphics, Data conversion, Electronic design automation

Showing 5 of 71 publications
Conference Committee Involvement (12)
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Photomask Technology
12 September 2016 | San Jose, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Optical Microlithography XXVI
26 February 2013 | San Jose, California, United States
Showing 5 of 12 published special sections
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