Peter Buck
Director Marketing-Calibre MDP/MPC at Mentor - a Siemens Business
SPIE Involvement:
Conference Program Committee | Conference Chair | Conference Co-Chair | Author | Editor
Area of Expertise:
Photomasks , OPC , Lithography Simulation
Websites:
Publications (74)

PROCEEDINGS ARTICLE | November 12, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Etching, Scanning electron microscopy, Photomasks, Double patterning technology, SRAF, Vestigial sideband modulation

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Computing systems, Data processing, Distributed computing, Optical proximity correction, Data communications, Data storage servers

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Visualization, Metals, Error analysis, Computer simulations, Image quality, Beam shaping, Optical proximity correction, Data corrections, Process modeling, Vestigial sideband modulation

SPIE Conference Volume | December 5, 2017

PROCEEDINGS ARTICLE | October 31, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Data modeling, Calibration, Photomasks, Optical proximity correction, Mask making, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology

Showing 5 of 74 publications
Conference Committee Involvement (13)
Photomask Technology
15 September 2019 | Monterey, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Photomask Technology
12 September 2016 | San Jose, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Showing 5 of 13 published special sections
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