Dr. Peter Choi
at NANO-UV SAS
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | June 7, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Plasma, Inspection, Metrology, Xenon, Multiplexing, Light sources, Ions, Tin, Capillaries

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Plasma, Extreme ultraviolet, Electrons, Ions, Modeling, Capillaries, Ionization, Particles, Extreme ultraviolet lithography, Nanoparticles

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Extreme ultraviolet, Plasma, Photodiodes, Data modeling, Tin, Multiplexing, Extreme ultraviolet lithography, Light sources, Photomasks, Capillaries

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Extreme ultraviolet, Plasma, Multiplexing, Metrology, Photomasks, Inspection, Capillaries, Light sources, EUV optics, Photodiodes

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Extreme ultraviolet, Plasma, Xenon, Electrons, Capillaries, Ions, Ionization, Modeling, Light sources, Metrology

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Extreme ultraviolet, Plasma, Multiplexing, Xenon, Ions, Extreme ultraviolet lithography, Light sources, Electrons, Metrology, Photomasks

Showing 5 of 6 publications
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