Dr. Peter Dress
Director Advanced Process Development at SUSS MicroTec Photomask Equipment GmbH & Co KG
SPIE Involvement:
Author
Publications (45)

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Glasses, Particles, Inspection, Oxygen, Photomasks, SRAF, Cavitation, Acoustics, Mask cleaning, Plasma

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Particles, Ions, Chemistry, Photomasks, SRAF, Cavitation, Acoustics, Thermodynamics, Mask cleaning, Liquids

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Argon, Particles, Energy transfer, Gases, Photomasks, SRAF, Cavitation, Acoustics, Stereolithography, Liquids

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Reticles, Particles, Chemistry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Cavitation, Acoustics, Ruthenium

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Mirrors, Sensors, Etching, Manufacturing, Photoresist materials, Photomasks, Critical dimension metrology, Optimization (mathematics), Photoresist processing, Temperature metrology

Showing 5 of 45 publications
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