Dr. Peter Evanschitzky
at Fraunhofer IISB
SPIE Involvement:
Author
Publications (65)

Proceedings Article | 24 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithography, Imaging systems, Extreme ultraviolet, Refractive index, Nanoimprint lithography, Reflectivity, Tantalum, Lithographic illumination

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Reflectivity, Multilayers, Photomasks, Extreme ultraviolet, Silicon, Molybdenum, Diffraction, Optimization (mathematics), Lithography, Optical lithography

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Metals, Plasma etching, Etching, Optical properties

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Diffraction, Photomasks, Extreme ultraviolet, 3D modeling, 3D image processing, Lithography, Projection systems

Proceedings Article | 10 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Material characterization, Photomasks, Extreme ultraviolet, Metals, Tellurium, Extreme ultraviolet lithography, Refractive index

Showing 5 of 65 publications
Conference Committee Involvement (3)
Modeling Aspects in Optical Metrology VII
24 June 2019 | Munich, Germany
Modeling Aspects in Optical Metrology
26 June 2017 | Munich, Germany
Modeling Aspects in Optical Metrology V
23 June 2015 | Munich, Germany
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