Dr. Peter Evanschitzky
at Fraunhofer IISB
SPIE Involvement:
Conference Program Committee | Author
Publications (61)

PROCEEDINGS ARTICLE | October 10, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Refractive index, Metals, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Material characterization, Tellurium

SPIE Journal Paper | August 11, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Photomasks, Nanoimprint lithography, Extreme ultraviolet, Phase shifts, Refractive index, Nickel, Ruthenium, Lithography, Reflectivity, Binary data

PROCEEDINGS ARTICLE | May 29, 2018
Proc. SPIE. 10694, Computational Optics II
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Imaging systems, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | May 28, 2018
Proc. SPIE. 10694, Computational Optics II
KEYWORDS: Staring arrays, Lithography, Diffraction, Imaging systems, Image resolution, Image quality, Photomasks, Nanoimprint lithography, Binary data, Phase shifts

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Thin films, Lithography, Refractive index, Nickel, Reflectivity, Photomasks, Extreme ultraviolet, Ruthenium, Phase shifts

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Diffraction, Particles, Computer simulations, Pellicles, Projection systems, Photomasks, Extreme ultraviolet, Critical dimension metrology, Light

Showing 5 of 61 publications
Conference Committee Involvement (3)
Modeling Aspects in Optical Metrology VII
24 June 2019 | Munich, Germany
Modeling Aspects in Optical Metrology
26 June 2017 | Munich, Germany
Modeling Aspects in Optical Metrology V
23 June 2015 | Munich, Germany
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top