Dr. Peter Hudek
at IMS Nanofabrication GmbH
SPIE Involvement:
Author
Websites:
Publications (22)

SPIE Journal Paper | 10 February 2024 Open Access
Mathias Tomandl, Christoph Spengler, Peter Hudek, Christof Klein, Hans Loeschner, Elmar Platzgummer
JM3, Vol. 23, Issue 01, 011205, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011205
KEYWORDS: Extreme ultraviolet, Distortion, Lenses, Nanofabrication, Industry, Magnetism, Industrial applications, Lithography, Extreme ultraviolet lithography, Projection systems

Proceedings Article | 1 November 2022 Paper
Michael Haberler, Peter Hudek, Elmar Platzgummer, Christoph Spengler, Lena Bachar, Steffen Steinert, Hui-Wen Lu-Walther, Dirk Beyer, Michal Jurkovic
Proceedings Volume 12472, 124720L (2022) https://doi.org/10.1117/12.2641517
KEYWORDS: Image registration, Calibration, Photomasks, Metrology, Overlay metrology, Electron beams, Extreme ultraviolet lithography, Distortion, Semiconductors

SPIE Journal Paper | 28 October 2021
Peter Hudek, Michal Jurkovic, Pavlina Choleva, Witold Wroczewski, Masahiro Hashimoto, Kazunori Ono, Toru Fukui, Toshiya Takahashi, Kotaro Takahashi
JM3, Vol. 20, Issue 04, 041402, (October 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041402
KEYWORDS: Photomasks, Extreme ultraviolet, Point spread functions, Photoresist processing, Extreme ultraviolet lithography, Scattering, Monte Carlo methods, Lithography, Electron beam lithography, Backscatter

Proceedings Article | 22 February 2021 Presentation
Michal Jurkovic, Peter Hudek, Pavlina Choleva, Witold Wroczewski, Masahiro Hashimoto, Kazunori Ono, Toru Fukui, Toshiya Takahashi, Kotaro Takahashi
Proceedings Volume 11610, 116100T (2021) https://doi.org/10.1117/12.2584588
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Scattering, Point spread functions, Photoresist processing, Numerical simulations, Lithography, Chemically amplified resists

Proceedings Article | 12 November 2018 Presentation + Paper
Ingo Bork, Peter Buck, Bhardwaj Durvasula, Stefan Eder-Kapl, Peter Hudek, Elmar Platzgummer, Rao Nageswara, Murali Reddy, Christoph Spengler, Jan Klikovits, Jed Rankin, Christian Bürgel, Michal Jurkovic
Proceedings Volume 10810, 108100K (2018) https://doi.org/10.1117/12.2503284
KEYWORDS: Photomasks, SRAF, Calibration, Cadmium, Lithography, Double patterning technology, Data modeling, Etching, Vestigial sideband modulation, Scanning electron microscopy

Showing 5 of 22 publications
Conference Committee Involvement (3)
ASDAM 2012 the 9th Int'l Conf. on Advanced Semiconductor Devices and Microsystems
11 November 2012 |
MNE 2012
16 September 2012 |
MNE 2011
19 September 2011 |
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