Dr. Peter Hudek
Technical Director Application at IMS Nanofabrication GmbH
SPIE Involvement:
Author
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Publications (18)

Proceedings Article | 12 November 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Etching, Scanning electron microscopy, Photomasks, Double patterning technology, SRAF, Vestigial sideband modulation

Proceedings Article | 20 October 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Lithography, Logic, Metals, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Optics manufacturing

Proceedings Article | 26 September 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Logic, Metals, Image processing, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Information operations

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Reticles, Metrology, Calibration, Manufacturing, Image registration, Photomasks, Beam shaping, Nanofabrication, Model-based design

Proceedings Article | 17 May 2013
Proc. SPIE. 8763, Smart Sensors, Actuators, and MEMS VI
KEYWORDS: Microelectromechanical systems, Sensors, Etching, Silicon, Laser ablation, Gallium nitride, Field effect transistors, Silicon carbide, Heterojunctions, Bulk micromachining

Proceedings Article | 28 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Manufacturing, Photomasks, Computed tomography, Maskless lithography, Semiconducting wafers, Nanofabrication, Prototyping

Showing 5 of 18 publications
Conference Committee Involvement (3)
ASDAM 2012 the 9th Int'l Conf. on Advanced Semiconductor Devices and Microsystems
11 November 2012 |
MNE 2012
16 September 2012 |
MNE 2011
19 September 2011 |
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