Dr. Peter Kuschnerus
at Carl Zeiss GmbH
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 16 June 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Photomasks, Binary data, Electron beams, Opacity, Chromium, Quartz, Etching, Signal processing, Image processing, Magnesium

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Semiconductors, Metrology, Wafer-level optics, Image quality, Lithographic illumination, CCD cameras, Binary data

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Photomasks, Lithography, Lithographic illumination, Reticles, Binary data, CCD cameras, Semiconducting wafers, Printing, Optical alignment, Charge-coupled devices

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Photomasks, Binary data, CCD image sensors, CCD cameras, Image quality, Semiconducting wafers, Vacuum ultraviolet, Lithography, Vibration control, Optical resolution

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Diffusers, Microscopes, Excimer lasers, Microlens array, Temporal coherence, Microlens, Optical lithography, Pulsed laser operation, Inspection, Speckle

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top