Peter D. Rhyins
Sr Development Engineer/CEO/CTO
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 10 July 2003 Paper
Proc. SPIE. 5042, Design and Process Integration for Microelectronic Manufacturing
KEYWORDS: Wafer-level optics, Lithography, Spatial frequencies, Photomasks, Optical proximity correction, Computer aided design, Neodymium, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 16 June 2003 Paper
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, Optical lithography, Etching, Quartz, Dry etching, Image processing, Scanning electron microscopy, Photomasks, Photoresist processing, Semiconducting wafers

Proceedings Article | 15 January 2003 Paper
Proc. SPIE. 4979, Micromachining and Microfabrication Process Technology VIII
KEYWORDS: Microelectromechanical systems, Photonic devices, Deep ultraviolet, Calibration, Photomasks, Computer aided design, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Binary data

SPIE Journal Paper | 1 October 2002
JM3 Vol. 1 Issue 03
KEYWORDS: Photomasks, Lithography, Phase shifts, Image processing, Optical proximity correction, Semiconducting wafers, Optical lithography, Inspection, Binary data, System on a chip

Proceedings Article | 30 July 2002 Paper
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Metrology, Coherence (optics), Etching, Quartz, Image processing, Photomasks, Mask making, Photoresist processing, Phase shifts

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top