Dr. Peter Weidner
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | October 3, 2008
Proc. SPIE. 7155, Ninth International Symposium on Laser Metrology
KEYWORDS: Metrology, Atomic force microscopy, Scatterometry, Dimensional metrology, Infrared radiation, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Thermal modeling, Model-based design

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Mid-IR, Metrology, Reflection, Silicon, 3D modeling, Scanning electron microscopy, Infrared spectroscopy, Spectroscopic ellipsometry, Infrared radiation, Semiconducting wafers

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Oxides, Metrology, Capacitors, Phase modulation, Etching, Atomic force microscopy, Scanning electron microscopy, Process control, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Oxides, Etching, Silicon, 3D modeling, Atomic force microscopy, Scatterometry, 3D metrology, Process control, Semiconducting wafers, Scatter measurement

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