Peter Zandbergen
at Philips Research
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Diffraction, Reticles, Polarization, Signal attenuation, Chromium, Printing, Photomasks, Optical proximity correction, Binary data, Phase shifts

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Diffraction, Reticles, Polarization, Chromium, Near field, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 4 May 2005 Paper
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Monochromatic aberrations, Point spread functions, Defect detection, Scattering, Particles, Scanning electron microscopy, Pellicles, Mie scattering, Immersion lithography, Liquids

Proceedings Article | 5 July 2000 Paper
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Reticles, Optical lithography, Lithographic illumination, Monte Carlo methods, Photomasks, Critical dimension metrology, Binary data, 193nm lithography, Resolution enhancement technologies

Proceedings Article | 26 July 1999 Paper
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Photomasks, Photoresist processing, Optics manufacturing, Binary data, 193nm lithography, Phase shifts, Fiber optic illuminators

Showing 5 of 9 publications
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