Dr. Phil Friddle
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Optical lithography, Etching, Interfaces, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Stochastic processes, Photoresist developing

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