Phil Stopford
at Synopsys Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 March 2020
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Lithography, Data modeling, Etching, Metals, Dielectrics, Photoresist materials, Photomasks, Stochastic processes, Process modeling, Defect inspection

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