Philip E. Freiberger
Product Manager at AIXTRON Inc / Genus
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Reticles, Metrology, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Binary data

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Metrology, Optical lithography, Manufacturing, Scanning electron microscopy, Process control, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

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