Philip Andrew Grunow
Vacuum Engineer/EE at Sandia National Labs Californias
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, Reticles, Sensors, Xenon, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics, Fiber optic illuminators

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Wafer-level optics, Contamination, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics, Plasma, Fiber optic illuminators, Oxidation

Proceedings Article | 1 July 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Carbon, Contamination, Etching, Silicon, Hydrogen, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Oxidation

Proceedings Article | 1 July 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Carbon, Contamination, Silicon, Reflectivity, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Fiber optic illuminators, Oxidation

Proceedings Article | 20 August 2001
Proc. SPIE. 4343, Emerging Lithographic Technologies V
KEYWORDS: Wafer-level optics, Carbon, Reticles, Contamination, Electrons, Bioalcohols, Extreme ultraviolet, EUV optics, Fiber optic illuminators, Oxidation

Proceedings Article | 20 August 2001
Proc. SPIE. 4343, Emerging Lithographic Technologies V
KEYWORDS: Carbon, Mirrors, Contamination, Silicon, Reflectivity, Oxygen, Extreme ultraviolet, Extreme ultraviolet lithography, Information operations, Oxidation

Showing 5 of 6 publications
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